Titanium Sputtering Target

Titanium Sputtering Target

Material: Gr.1, Gr.2, Gr.3, Gr.7, Gr.9, Gr.12, Gr.16, etc.

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Purity: 99.95%-99.995%

• Custom sizes and standard sizes in stock
• Quick Lead Time
• Competitive Price

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Titanium Sputtering Target is one of the most widely used target materials, made from high-purity titanium. It offers superior performance and reliability for various thin film deposition applications. As a leading supplier and manufacturer of premium titanium products, Heeger Materials leverages advanced technology to deliver high-purity titanium and titanium alloy sputtering targets for various applications.

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Titanium Sputtering Target Data Sheet

Titanium Sputtering Target

Titanium (Ti), a silver transition metal with a low density of 4.54 g/cm3, exhibits lightweight, high strength, and corrosion resistance. Titanium Sputtering Target is made from high-purity titanium powder, ensuring excellent consistency and uniformity during sputtering processes. It is one of the barrier film materials commonly used in ultra-large-scale integrated circuit chips. HM can supply customized purity, size, and density solutions according to specific requirements.

Titanium Sputtering Target Material Chemical Composition

Titanium Sputtering Target Specifications

Titanium Sputtering Target Stock Dimensions

Titanium Sputtering Target Microstructure Image

Titanium Sputtering Target Advantages

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Titanium Sputtering Target Production Process

Generally prepared using the powder metallurgy method, the purity of titanium powder should be above 99.95%. The specific process is as follows:

• Put the titanium powder in the vacuum heat treatment furnace for pre-gassing, then introduce hydrogen and continue heating for degassing.
• The degassed titanium powder is sintered once by vacuum hot pressing.
• The primary sintered product is passed through a hot isostatic press to complete the secondary sintering.
• After the secondary sintering, the whole surface of the product is ground by machining to get the final product.

Titanium Sputtering Target Applications

• Titanium sputtering target can be used as the barrier film material for ultra-large-scale integrated circuit chips.
• Titanium sputtering target is ideal for depositing thin film for flat panel displays.
• Titanium sputtering target is commonly used in Physical Vapor Deposition (PVD) and Magnetron Sputtering techniques to produce optical thin films, anti-reflective films, etc.
• Titanium sputtering target helps make components exceptionally light, thin, small, and densely packed, when sputtered to create interconnections in LSI, VLSI, and ULSI.

Titanium Sputtering Target Packaging

The Titanium Sputtering Target is carefully placed in wooden cases or cartons with additional support from soft materials to prevent any shifting during transportation. This packaging method guarantees the integrity of the products throughout the delivery process.

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To customize your titanium sputtering target, please provide the following details:

1. Diameter (for the circular sputtering targets)
2. Width × Length (for the rectangular sputtering targets)
3. Thcikness (for the sputtering targets)
4. Purity of the material
5. Backing Plate (If bonding service is required, please specify the material and dimensions of the backing plate.）
6. Quantity of the products you need
7. Alternatively, you can provide a drawing with your specifications.

Once we have these details, we can provide you with a quote within 24 hours.

We carry a wide variety of titanium and titanium alloy products in stock, and for these, there is generally no minimum order requirement. However, for custom orders, we typically set a minimum order value of $200. The lead time for stock items is usually 1-2 weeks, while custom orders usually take 3-4 weeks, depending on the specifics of the order.

DFARS (Defense Federal Acquisition Regulation Supplement) compliance is primarily concerned with the sourcing of materials for defense-related applications in the United States. According to DFARS, certain materials used in defense must be sourced from the United States or qualifying countries.

If you have specific titanium materials that are subject to DFARS, please let us know in advance and we will confirm.

At Heeger Materials Inc., we take this responsibility seriously. We adhere to all applicable laws and regulations, including Section of the Dodd-Frank Act. Our company operates with a strict code of ethics and is committed to only partnering with suppliers who share our dedication to responsible sourcing. We support the initiatives and programs aimed at promoting “conflict-free” supply chains and work diligently to ensure that our products meet these standards.

Heeger Materials Inc., established in in Colorado, USA, is a specialized supplier and manufacturer of tantalum and tantalum alloys. With extensive expertise in supply and export, we offer competitive pricing and customized solutions tailored to specific requirements, ensuring outstanding quality and customer satisfaction. As a professional provider of refractory metals, specialty alloys, spherical powders, and various advanced materials, we serve the research, development, and large-scale industrial production needs of the scientific and industrial sectors.

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Sputtering Targets Products

Heeger Metal offers a wide selection of high-performance sputtering targets made from materials like titanium, copper, aluminum, and rare earth metals. Our custom sputtering targets are precision-engineered to meet the demands of industries such as semiconductor manufacturing, photovoltaics, and electronics. With superior purity and consistency, our sputtering targets deliver exceptional film deposition performance, making them ideal for thin-film coating, sputtering, and PVD (Physical Vapor Deposition) applications.

Other Titanium Products

Heeger Metal offers a comprehensive range of titanium and titanium alloy products, including powders and finished parts, with customization options available. Renowned for their exceptional strength, corrosion resistance, and high-temperature stability, these materials are perfect for aerospace, electronics, and chemical processing applications.

Sputtering Targets Overview: Everything You Need to Know

views, Updated: -07-01

If you work with materials or electronics, you might have heard of "sputtering targets." It can be confusing if you're new to it, but they are basically materials used to put thin films on electronic devices. There's a lot to learn about them, like the different types and methods used. This guide covers everything you need to know, whether you're a beginner or an expert in thin film deposition.
 

What are sputtering targets made of?

Sputtering targets are made of various materials depending on their purpose. These can be metals, ceramics, alloys, or composites.

Metal targets are commonly used because they conduct heat and electricity well and can create many different alloys. Examples of metals used for sputtering include gold, silver, copper, aluminum, and titanium.

Ceramic targets are known for their strength, resistance to wear, and resistance to chemicals. Examples of ceramics used for sputtering include aluminum oxide, silicon dioxide, and titanium dioxide.

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Want more information on titanium sputtering targets? Feel free to contact us.

Alloy targets are made by mixing two or more metals to create specific physical or chemical properties. For instance, a mixture of gold and silver can create a thin film that is conductive, but not as much as pure gold or pure silver.

Composite targets are produced by mixing different materials, such as metal and ceramic, to create a specific combination of properties. For example, a composite target made of copper and aluminum oxide can produce a thin film that is highly conductive and adheres well to a surface.
 

What is sputtering and how does it work?

Sputtering is a way to transfer material from a sputtering target to a substrate surface. This happens in a vacuum chamber when a low-pressure gas (usually argon) is introduced.

The gas is turned into a plasma by an electrical discharge, creating positively charged ions and free electrons. These ions move towards the sputtering target and hit its atoms, knocking them loose. These atoms then travel through the vacuum chamber and stick to the substrate surface, creating a thin film.

There are different ways to sputter, like DC sputtering and RF sputtering, reactive sputtering, and magnetron sputtering. Each way has its pros and cons, depending on the application and desired properties of the thin film.
 

Types of Sputtering Targets

Sputtering targets are made of different materials to create thin films. There are four main types of sputtering targets:

• Metal targets:These are widely used because they conduct heat and electricity well. They're made from gold, silver, copper, aluminum, and titanium.
• Ceramic targets: These are hard, wear-resistant, and chemically stable. Typical ceramics used include silicon dioxide, aluminum oxide, and titanium dioxide.
• Alloy targets: These are made by combining two or more metals to create specific properties. For example, an alloy of nickel and chromium could be used to make Nickel Chromium Targets.
• Composite targets: These are made by combining two or more materials of different types to create specific properties. For example, a copper and aluminum oxide composite target.

Applications of sputtering targets

Sputtering targets are used to make thin films in many different industries. These thin films are used to make things like semiconductor manufacturing, hard drives, and solar panels.

In semiconductor manufacturing, sputtering targets are used to put tiny bits of metal and other materials onto silicon wafers. This makes the complicated structures that are needed for our electronic devices to work.

In hard drive manufacturing, sputtering targets are used to put thin films of magnetic materials onto the disks. This lets us store vast amounts of digital data.

In making lenses and mirrors, sputtering targets are used to put thin films of metals and other special materials onto the glass. This makes the lenses and mirrors work better.

In making solar panels, sputtering targets are used to put thin films of metals and other materials onto silicon wafers. This makes complicated structures that can turn sunlight into electricity.

Quality Control and Testing Methods for Sputtering Targets

Making sputtering targets of good quality is very important in manufacturing. When making these targets, we need to check that the material is pure and doesn't have any dirt or other stuff in it. We also need to make sure that the target has the right size and shape, and that it has a smooth surface. Lastly, we need to make sure that it is not broken or dirty when it gets to the factory.

Testing the Material

We test the material to make sure it is pure and doesn't have any dirt or other stuff in it. Testing instruments like X-ray machines, inductively coupled plasma (ICP) analysis, and glow discharge mass spectrometry (GDMS).

Checking the Dimensions

We check the size and shape of the target to make sure it meets the requirements. We use machines like optical profilometry, coordinate measuring machines (CMM), and laser scanning

Verifying the Surface Finish

We check the surface of the target to make sure it has the required surface finish and roughness. We use machines like scanning electron microscopy (SEM), atomic force microscopy (AFM), and optical microscopy.

Checking for Damage and Dirt

We check for any damage or dirt on the target to make sure it is not broken or dirty during transportation and storage. Techniques used for this include visual inspection, leak testing, and vacuum packaging.
 

Maintaining and Handling Sputtering Targets

To make sure your sputtering targets last long and perform well, you need to take good care of them. Here's how:

1. Store targets in a clean, dry place, away from things that might make them dirty.
2. Handle targets carefully, using clean gloves and tools so you don't add dirt to them.
3. Check targets often for wear and tear, like cracks or pits, which can make them work worse.
4. Clean targets often to get rid of any dirt or other stuff that has built up on them.

Conclusion:

Sputtering targets are important for making high-quality electronics, optics, and other advanced materials. Whether you're new to thin film deposition or already know a lot about it, this guide has given you a good idea of what you need to know about sputtering targets. 

To make good films, it's important to know about the different types of targets, how they're made, and how to check their quality. As a sputtering target supplier, we can give you some valuable suggestions if you want to solution for your project. 

Contact us to discuss your requirements of graphite target. Our experienced sales team can help you identify the options that best suit your needs.

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